STI CMP Consumable Set Delivers Low Defectivity and Excellent Planarity
AURORA, Ill., Jan. 15 /PRNewswire-FirstCall/ -- Cabot Microelectronics
Corp. (Nasdaq: CCMP), the leading supplier of chemical mechanical
planarization (CMP) polishing slurries to the semiconductor industry, today
announced that its new direct shallow trench isolation (STI) slurry,
SiLECT(TM) 6000 in combination with its new line of Epic(R) A110 polishing
pads has been adopted by a major integrated circuit (IC) manufacturer for use
in its high volume 90-nm manufacturing process.
Employing a breakthrough direct STI polishing mechanism known as
"Selective Deceleration", SiLECT(TM) 6000 is designed to deliver exceptional
process performance in both 200 mm and 300 mm manufacturing processes. Easy-
to-use and fully compatible with existing CMP polishing tools and delivery
systems, SiLECT(TM) 6000 is designed to improve process yields and reduce
overall cost-of-ownership.
Cabot Microelectronics' Epic(R) A110 CMP polishing pads are designed to
deliver superior defect performance and pad-to-pad reliability in both 200 mm
and 300 mm manufacturing processes. Manufactured in a highly consistent,
single sheet format under cleanroom conditions, these CMP polishing pads
incorporate robust grooving and window technologies.
By taking full advantage of both technologies in a consumable set, the IC
manufacturer has been able to achieve optimized performance in their 90-nm STI
process. "Our new direct STI technology has eliminated the need for expensive
on-site mixing required by older direct STI technologies. The new process is
simple to implement in manufacturing environments where consistent results are
required," said Steve Smith, vice president of sales and marketing at Cabot
Microelectronics. "By using our SiLECT(TM) 6000 slurry and Epic(R) A110 pads,
we have enabled a 90-nm process that provides low defectivity, excellent
planarity, and highly consistent performance in full-scale manufacturing."
About Cabot Microelectronics
Cabot Microelectronics Corp., headquartered in Aurora, Ill., is the
leading supplier of CMP slurries for polishing various materials used in
semiconductor manufacturing processes. These products enable manufacturers of
ICs to make smaller, faster and more complex devices and improve their
production processes. For more information about Cabot Microelectronics,
visit www.cabotcmp.com or call 630-499-2600.
Safe Harbor Statement
This news release may include statements that constitute "forward-looking
statements" within the meaning of federal securities regulations. These
forward-looking statements include statements related to product performance,
future sales and operating results, company and industry growth and trends,
growth of this market, international events, new product introductions and
development of new products and technologies by Cabot Microelectronics. These
forward-looking statements involve a number of risks, uncertainties, and other
factors, including those described from time to time in Cabot
Microelectronics' filings with the Securities and Exchange Commission (SEC),
that could cause the actual results to differ materially from those described
by these forward-looking statements. In particular, see "Risks Relating to
Our Business" in Management's Discussion and Analysis in our annual report on
Form 10-K for the fiscal year ended September 30, 2003, filed with the SEC.
Cabot Microelectronics Corporation assumes no obligation to update this
forward-looking statement.
Contact:
Gautam Grover
Global Marketing Manager
Cabot Microelectronics Corporation
630-375-5567
SOURCE Cabot Microelectronics Corporation
-0- 01/15/2004
/CONTACT: Gautam Grover, Global Marketing Manager of Cabot
Microelectronics Corporation, +1-630-375-5567/
/Web site: http://www.cabotcmp.com /
(CCMP)
CO: Cabot Microelectronics Corporation
ST: Illinois
IN: CHM CPR SEM ECP
SU: CON
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1552 01/15/2004 08:00 EST http://www.prnewswire.com